THIN FILM DEPOSITION

PACIFIC RIM Thin Films provides vacuum deposited thin films for diverse applications such as biomedical devices, semiconductors, micromachining, optical components and many other fields. We have extensive experience in MEMS related technologies and can provide low-temperature, low-stress films.

Below is a list of PACIFIC RIM’S most common films:

Thermal Oxide
PECVD Oxide
PETEOS
PECVD a-Si ((Doped and Undoped)
LPCVD Silicon
LPCVD Nitride
PECVD Nitride
Metals: Al, Ta, Ti, TiN, TiW, TaN, Cr, Cu, Al-Cu, Ni, Ru, Pd, Co, Ni,TiO2, Pt, Ag, Au.

Etching
Wet etching and cleaning (HF, Piranha, RCA, etc.)
RIE etching of oxides, nitrides, metals, and silicon
Xenon Difluoride, TMAH

Annealing
Glass annealing
Rapid Thermal Annealing –including metalized substrates
Forming Gas Annealing

Characterization
SEM with Electron backscatter diffraction analysis (EBSD)
AFM
X-Ray Diffraction
Ellipsometry